Polymers for Microelectronics: Resists and Dielectrics - ACS Symposium Series 537 (Hardback)L. F. Thompson (editor)
Hardback 554 Pages / Published: 01/01/1994
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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
Publisher: American Chemical Society
Number of pages: 554
Weight: 880 g
Dimensions: 234 x 158 x 32 mm
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