Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology 7 (Hardback)Minoru Sugawara (author)
Hardback 356 Pages / Published: 28/05/1998
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Publisher: Oxford University Press
Number of pages: 356
Weight: 743 g
Dimensions: 242 x 163 x 23 mm
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