Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology 7 (Hardback)
  • Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology 7 (Hardback)
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Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology 7 (Hardback)

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£175.00
Hardback 356 Pages / Published: 28/05/1998
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Publisher: Oxford University Press
ISBN: 9780198562870
Number of pages: 356
Weight: 743 g
Dimensions: 242 x 163 x 23 mm

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