Photomask and Next-Generation Lithography Mask Technology XXI - Proceedings of SPIE (Paperback)
  • Photomask and Next-Generation Lithography Mask Technology XXI - Proceedings of SPIE (Paperback)
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Photomask and Next-Generation Lithography Mask Technology XXI - Proceedings of SPIE (Paperback)

(editor)
£83.95
Paperback 278 Pages / Published: 30/11/2014
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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Publisher: SPIE Press
ISBN: 9781628413236
Number of pages: 278
Dimensions: 229 x 152 mm

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