The discovery of high Tc superconductors, colossal magnetoresistance, and recently diluted magnetic semiconductors has spurred a great deal of research activity in oxide thin films within the condensed matter and materials science communities. "Oxide Thin Films" provides an introduction to and review of oxide thin film physics, with an emphasis on experimental techniques. After a brief introductory chapter describing the unique properties of oxides, the first part of this book is devoted to the most common techniques used in the deposition and formation of oxide thin films, including sputtering, MOCVD, MBE, and PLD. The next two parts discuss the variety of methods used in the structural and physical characterization of thin films, from basic x-ray diffraction to near field microscopy, TEM, and neutron diffraction. The final section of this book reviews the technological applications of oxide thin films.
Publisher: Taylor & Francis Ltd