Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology.
Publisher: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
Number of pages: 710
Weight: 1110 g
Dimensions: 235 x 155 x 37 mm
Edition: Softcover reprint of hardcover 1st ed. 2005
You may also be interested in...
Please sign in to write a review