
Handbook of Photomask Manufacturing Technology (Hardback)
Syed Rizvi (editor)
£210.00
Hardback
728 Pages /
Published: 07/04/2005
- We can order this
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available.
The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.
Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.
Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Publisher: Taylor & Francis Inc
ISBN: 9780824753740
Number of pages: 728
Weight: 1429 g
Dimensions: 254 x 178 x 39 mm
MEDIA REVIEWS
". . . a stellar addition to this field . . . a must-have for every mask maker's library . . . there is too much in this book that is absolutely fantastic."
- Dan Hutcheson, in Paper Details, March 2007
You may also be interested in...
Please sign in to write a review
Sign In / Register
Not registered? CREATE AN ACCOUNTCREATE A plus ACCOUNT
Sign In
Download the Waterstones App
Would you like to proceed to the App store to download the Waterstones App?
Click & Collect
Reserve online, pay on collection.
Please note that owing to current COVID-19 restrictions, many of our shops are closed. Find out more by clicking here.
Please note that owing to current COVID-19 restrictions, many of our shops are closed. Find out more by clicking here.
Thank you for your reservation
Your order is now being processed and we have sent a confirmation email to you at
When will my order be ready to collect?
Following the initial email, you will be contacted by the shop to confirm that your item is available for collection.
Call us on or send us an email at
Unfortunately there has been a problem with your order
Please try again or alternatively you can contact your chosen shop on or send us an email at