Handbook of Photomask Manufacturing Technology (Hardback)Syed Rizvi (editor)
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The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.
Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Publisher: Taylor & Francis Inc
Number of pages: 728
Weight: 1429 g
Dimensions: 254 x 178 x 39 mm
". . . a stellar addition to this field . . . a must-have for every mask maker's library . . . there is too much in this book that is absolutely fantastic."
- Dan Hutcheson, in Paper Details, March 2007
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