Ferroelectric Dielectrics Integrated on Silicon (Hardback)
  • Ferroelectric Dielectrics Integrated on Silicon (Hardback)

Ferroelectric Dielectrics Integrated on Silicon (Hardback)

Hardback 462 Pages / Published: 25/10/2011
  • We can order this

Usually dispatched within 1 week

  • This item has been added to your basket
This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies. After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films.

Publisher: ISTE Ltd and John Wiley & Sons Inc
ISBN: 9781848213135
Number of pages: 462
Weight: 804 g
Dimensions: 239 x 160 x 30 mm

You may also be interested in...

Please sign in to write a review

Your review has been submitted successfully.