Electron-Beam, X-Ray, Euv, and Ion-Beam Submicrometer Lithographies for Manufacturing V: 20-21 February 1995, Santa Clara, California (Paperback)John M Warlaumont (author)
Paperback 450 Pages / Published: 01/01/1995
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Publisher: SPIE Press
Number of pages: 450
Weight: 1066 g
Dimensions: 279 x 222 mm
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