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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Hardback)John E. J. Schmitz (author)
Hardback 251 Pages / Published: 31/12/1992
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This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
Publisher: William Andrew Publishing
Number of pages: 251
Weight: 470 g
Dimensions: 229 x 152 x 15 mm
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