Visit our Christmas Gift Finder
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Springer Series in Surface Sciences 49 (Hardback)
  • Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Springer Series in Surface Sciences 49 (Hardback)
zoom

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide - Springer Series in Surface Sciences 49 (Hardback)

(author)
£159.99
Hardback 528 Pages / Published: 25/10/2012
  • We can order this

Usually dispatched within 3 weeks

  • This item has been added to your basket

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Publisher: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
ISBN: 9783642273803
Number of pages: 528
Weight: 9398 g
Dimensions: 235 x 155 x 34 mm
Edition: 2013 ed.

You may also be interested in...

Symmetry and Spectroscopy
Added to basket
Interpreting Organic Spectra
Added to basket
Basic Chemistry Concepts and Exercises
Added to basket
Quantitative Chemical Analysis
Added to basket
Exploring Chemical Analysis
Added to basket
Introduction to Spectroscopy
Added to basket
Pocket Guide to Biomolecular NMR
Added to basket
NMR: The Toolkit
Added to basket
£19.99
Paperback
Theory of Stellar Atmospheres
Added to basket

Please sign in to write a review

Your review has been submitted successfully.